Ultimate Sidebar

Laser assisted chemical vapour deposition of silicon oxide layers

300 139
This paper focuses on the deposition of silicon oxide thin films, using laser assisted CVD based on a CO_2 laser, and on the feasibility of the process for coating porous silicon samples. Scanning electron and atomic force microscopy were used to analyse the morphology and microstructure of the films, while structure and chemical composition were determined by Fourier transform infrared and Rutherford backscattering spectroscopy. Two-wavelength ellipsometry was used for thickness and refractive index evaluation. The photoluminescence of SiO_2/PS was measured and compared with tha of uncoated samples. direct c 1999 Elsevier Science B.V. All rights reserved.
来源: https://www.10026.com/waiwenhuiyi_thesis/j85myb.html [免费获取该论文&期刊全文请访问原址]
Subscribe to our newsletter
Sign up here to get the latest news, updates and special offers delivered directly to your inbox.
You can unsubscribe at any time

Leave A Reply

Your email address will not be published.